The ZEISS EC Epiplan 20x/0.4 HD objective is a high-definition lens developed for technical and materials microscopy. It provides 20x magnification with a numerical aperture of 0.40, delivering sharp, high-contrast images with excellent detail reproduction. This infinity-corrected objective features a semi-planachromatic design for improved field flatness and color correction.

The ZEISS EC Epiplan 20x/0.4 M27 objective is an enhanced-contrast lens developed for technical microscopy applications. It provides 20x magnification with a numerical aperture of 0.4 and features a working distance of 3.2 mm, allowing convenient specimen access and precise focusing. Cover glass correction is not required. EC Epiplan objectives are universal lenses designed for brightfield, differential interference contrast (DIC), and polarization techniques.

The ZEISS EC Epiplan 50x/0.75 HD objective is a high-definition lens developed for technical and materials microscopy. It delivers 50x magnification with a numerical aperture of 0.75, ensuring sharp, high-contrast images with excellent detail resolution. This infinity-corrected objective features a semi-planachromatic design for improved field flatness and color correction.

The ZEISS EC Epiplan 50x/0.75 M27 objective is an enhanced-contrast lens developed for technical microscopy applications. It offers 50x magnification with a numerical aperture of 0.75 and a working distance of 1.0 mm. This model does not require cover glass correction and is designed for dry use without immersion oil. EC Epiplan objectives are universal lenses suitable for brightfield, differential interference contrast (DIC), and polarization techniques.

The ZEISS EC Epiplan 50x/0.75 Pol objective is an enhanced-contrast lens developed for technical microscopy and polarization applications. It provides 50x magnification with a numerical aperture of 0.75, delivering sharp, high-contrast images with excellent detail. This infinity-corrected objective features a semi-planachromatic design for improved field flatness and color correction.

The ZEISS EC Epiplan 5x/0.13 HD objective is a high-definition lens developed for technical and materials microscopy. It offers 5x magnification with a numerical aperture of 0.13, providing clear, high-contrast images with reliable detail. This infinity-corrected objective features a semi-planachromatic design for improved field flatness and color correction.

The ZEISS EC Epiplan 5x/0.13 M27 objective is an enhanced-contrast lens designed for technical microscopy applications. It provides 5x magnification with a numerical aperture of 0.13 and features a long working distance of 11.8 mm, allowing convenient specimen handling and precise focusing. Cover glass correction is not required. EC Epiplan objectives are universal lenses suitable for brightfield, differential interference contrast (DIC), and polarization techniques.