Optics

The ZEISS A-Plan 40x/0.65 Ph2 objective is a plan-achromatic lens designed for precise microscopic observation with Phase 2 contrast capability. It provides 40x magnification and a numerical aperture of 0.65, delivering sharp, high-contrast images with enhanced visibility of transparent specimens. This infinity-corrected objective features a flat field (plan) design to ensure consistent image quality across the entire field of view.

The ZEISS A-Plan 40x/0.65 Pol objective is a plan-achromatic lens designed for detailed microscopic observation, including polarization applications. It provides 40x magnification with a numerical aperture of 0.65, ensuring sharp, high-contrast image quality. This infinity-corrected objective features a flat field (plan) design for uniform sharpness across the entire field of view.

The ZEISS A-Plan 5x/0.12 M27 objective is a plan-achromatic lens designed for both routine and research microscopy. It provides 5x magnification with a numerical aperture of 0.12 and supports cover glass correction from 0 to 1.00 mm. The working distance is 10.1 mm, allowing comfortable specimen handling and easy focusing. A-Plan objectives offer a reliable alternative to Achroplan lenses, delivering high-contrast images across a field number of up to 23 mm.

The ZEISS A-Plan 5x/0.12 Pol objective is a plan-achromatic lens designed for low-magnification microscopy, including polarization applications. It provides 5x magnification with a numerical aperture of 0.12, ensuring clear and evenly distributed image quality across the entire field of view. This infinity-corrected objective features a flat field (plan) design for consistent sharpness.

The ZEISS A-Plan 63x/0.8 Pol objective is a plan-achromatic lens designed for detailed microscopic observation, including polarization applications. It offers 63x magnification with a numerical aperture of 0.80, delivering sharp, high-contrast images with excellent resolution. This infinity-corrected objective features a flat field (plan) design to ensure consistent image quality across the entire field of view.

The ZEISS A-Plan 63x/0.8 objective is a plan-achromatic lens developed for high-resolution microscopic observation. It provides 63x magnification with a numerical aperture of 0.80, delivering sharp, detailed images with excellent contrast. This infinity-corrected objective features a flat field (plan) design to ensure uniform image quality across the entire field of view.

The ZEISS Antiflex Cap is designed specifically for the EC Epiplan-Neofluar 1.25x/0.03 objective. It helps reduce unwanted reflections and stray light, improving image contrast and overall optical performance during technical microscopy applications.

The ZEISS Antiflex Cap is designed for use with the EC Epiplan-Neofluar 2.5x/0.06 objective. It minimizes reflections and stray light, helping to improve image contrast and overall optical performance in technical microscopy applications.

The ZEISS EC Epiplan 100x/0.85 HD objective is a high-definition lens developed for demanding technical microscopy applications. It delivers 100x magnification with a numerical aperture of 0.85, ensuring sharp, high-contrast image quality and excellent detail reproduction. This infinity-corrected objective features a semi-planachromatic design for improved flatness and color correction across the field of view.

The ZEISS EC Epiplan 10x/0.25 HD objective is a high-definition lens designed for technical and materials microscopy. It provides 10x magnification with a numerical aperture of 0.25, delivering sharp, high-contrast images with reliable detail. This infinity-corrected objective features a semi-planachromatic design for improved field flatness and color correction.

The ZEISS EC Epiplan 10x/0.25 M27 objective is an enhanced-contrast lens developed for technical microscopy applications. It provides 10x magnification with a numerical aperture of 0.25 and offers a long working distance of 11.0 mm, making it particularly suitable for materials testing and inspection tasks. EC Epiplan objectives are universal lenses designed for brightfield, differential interference contrast (DIC), and polarization techniques.

The ZEISS EC Epiplan 10x/0.25 Pol objective is an enhanced-contrast lens designed for technical microscopy and polarization applications. It provides 10x magnification with a numerical aperture of 0.25, delivering clear, high-contrast images with reliable detail. This infinity-corrected objective features a semi-planachromatic design for improved field flatness and color correction.

The ZEISS EC Epiplan 20x/0.4 HD objective is a high-definition lens developed for technical and materials microscopy. It provides 20x magnification with a numerical aperture of 0.40, delivering sharp, high-contrast images with excellent detail reproduction. This infinity-corrected objective features a semi-planachromatic design for improved field flatness and color correction.

The ZEISS EC Epiplan 20x/0.4 M27 objective is an enhanced-contrast lens developed for technical microscopy applications. It provides 20x magnification with a numerical aperture of 0.4 and features a working distance of 3.2 mm, allowing convenient specimen access and precise focusing. Cover glass correction is not required. EC Epiplan objectives are universal lenses designed for brightfield, differential interference contrast (DIC), and polarization techniques.

The ZEISS EC Epiplan 50x/0.75 HD objective is a high-definition lens developed for technical and materials microscopy. It delivers 50x magnification with a numerical aperture of 0.75, ensuring sharp, high-contrast images with excellent detail resolution. This infinity-corrected objective features a semi-planachromatic design for improved field flatness and color correction.

The ZEISS EC Epiplan 50x/0.75 M27 objective is an enhanced-contrast lens developed for technical microscopy applications. It offers 50x magnification with a numerical aperture of 0.75 and a working distance of 1.0 mm. This model does not require cover glass correction and is designed for dry use without immersion oil. EC Epiplan objectives are universal lenses suitable for brightfield, differential interference contrast (DIC), and polarization techniques.

The ZEISS EC Epiplan 50x/0.75 Pol objective is an enhanced-contrast lens developed for technical microscopy and polarization applications. It provides 50x magnification with a numerical aperture of 0.75, delivering sharp, high-contrast images with excellent detail. This infinity-corrected objective features a semi-planachromatic design for improved field flatness and color correction.

The ZEISS EC Epiplan 5x/0.13 HD objective is a high-definition lens developed for technical and materials microscopy. It offers 5x magnification with a numerical aperture of 0.13, providing clear, high-contrast images with reliable detail. This infinity-corrected objective features a semi-planachromatic design for improved field flatness and color correction.

The ZEISS EC Epiplan 5x/0.13 M27 objective is an enhanced-contrast lens designed for technical microscopy applications. It provides 5x magnification with a numerical aperture of 0.13 and features a long working distance of 11.8 mm, allowing convenient specimen handling and precise focusing. Cover glass correction is not required. EC Epiplan objectives are universal lenses suitable for brightfield, differential interference contrast (DIC), and polarization techniques.

The ZEISS Objective EC Epiplan-Neofluar 2.5x/0.06 is a precision optical component designed for use in advanced microscopy applications. It is engineered to deliver reliable image quality and accurate magnification, making it suitable for educational and university environments. 

The ZEISS Objective EC Epiplan-Neofluar POL 5x/0.13 is a high-quality microscope objective designed for precise optical performance in educational and academic environments. It is built with infinity-corrected optics to ensure accurate image reproduction and compatibility with modern microscope systems. 

The ZEISS EC Epiplan Achro 100x/0.8 dry microscope objective is designed for high-magnification material and surface analysis. It provides precise image reproduction with infinity-corrected optics, making it suitable for advanced laboratory and academic applications.

The ZEISS EC Epiplan Achro 100x/0.8 dry microscope objective is designed for high-magnification material and surface analysis. It provides precise image reproduction with infinity-corrected optics, making it suitable for advanced laboratory and academic applications.

The ZEISS Objective EC Plan-Neofluar 10x/0.3 is a precision microscope objective designed for clear, flat-field imaging in educational and academic laboratories. Its plan optical correction ensures high image quality across the entire field of view, making it suitable for detailed specimen observation.