Lens

The ZEISS Antiflex Cap is designed specifically for the EC Epiplan-Neofluar 1.25x/0.03 objective. It helps reduce unwanted reflections and stray light, improving image contrast and overall optical performance during technical microscopy applications.

The ZEISS Antiflex Cap is designed for use with the EC Epiplan-Neofluar 2.5x/0.06 objective. It minimizes reflections and stray light, helping to improve image contrast and overall optical performance in technical microscopy applications.

The ZEISS EC Epiplan 100x/0.85 HD objective is a high-definition lens developed for demanding technical microscopy applications. It delivers 100x magnification with a numerical aperture of 0.85, ensuring sharp, high-contrast image quality and excellent detail reproduction. This infinity-corrected objective features a semi-planachromatic design for improved flatness and color correction across the field of view.

The ZEISS EC Epiplan 10x/0.25 HD objective is a high-definition lens designed for technical and materials microscopy. It provides 10x magnification with a numerical aperture of 0.25, delivering sharp, high-contrast images with reliable detail. This infinity-corrected objective features a semi-planachromatic design for improved field flatness and color correction.

The ZEISS EC Epiplan 10x/0.25 M27 objective is an enhanced-contrast lens developed for technical microscopy applications. It provides 10x magnification with a numerical aperture of 0.25 and offers a long working distance of 11.0 mm, making it particularly suitable for materials testing and inspection tasks. EC Epiplan objectives are universal lenses designed for brightfield, differential interference contrast (DIC), and polarization techniques.

The ZEISS EC Epiplan 10x/0.25 Pol objective is an enhanced-contrast lens designed for technical microscopy and polarization applications. It provides 10x magnification with a numerical aperture of 0.25, delivering clear, high-contrast images with reliable detail. This infinity-corrected objective features a semi-planachromatic design for improved field flatness and color correction.

The ZEISS EC Epiplan 20x/0.4 HD objective is a high-definition lens developed for technical and materials microscopy. It provides 20x magnification with a numerical aperture of 0.40, delivering sharp, high-contrast images with excellent detail reproduction. This infinity-corrected objective features a semi-planachromatic design for improved field flatness and color correction.

The ZEISS EC Epiplan 20x/0.4 M27 objective is an enhanced-contrast lens developed for technical microscopy applications. It provides 20x magnification with a numerical aperture of 0.4 and features a working distance of 3.2 mm, allowing convenient specimen access and precise focusing. Cover glass correction is not required. EC Epiplan objectives are universal lenses designed for brightfield, differential interference contrast (DIC), and polarization techniques.

The ZEISS EC Epiplan 50x/0.75 HD objective is a high-definition lens developed for technical and materials microscopy. It delivers 50x magnification with a numerical aperture of 0.75, ensuring sharp, high-contrast images with excellent detail resolution. This infinity-corrected objective features a semi-planachromatic design for improved field flatness and color correction.

The ZEISS EC Epiplan 50x/0.75 M27 objective is an enhanced-contrast lens developed for technical microscopy applications. It offers 50x magnification with a numerical aperture of 0.75 and a working distance of 1.0 mm. This model does not require cover glass correction and is designed for dry use without immersion oil. EC Epiplan objectives are universal lenses suitable for brightfield, differential interference contrast (DIC), and polarization techniques.

The ZEISS EC Epiplan 50x/0.75 Pol objective is an enhanced-contrast lens developed for technical microscopy and polarization applications. It provides 50x magnification with a numerical aperture of 0.75, delivering sharp, high-contrast images with excellent detail. This infinity-corrected objective features a semi-planachromatic design for improved field flatness and color correction.

The ZEISS EC Epiplan 5x/0.13 HD objective is a high-definition lens developed for technical and materials microscopy. It offers 5x magnification with a numerical aperture of 0.13, providing clear, high-contrast images with reliable detail. This infinity-corrected objective features a semi-planachromatic design for improved field flatness and color correction.

The ZEISS EC Epiplan 5x/0.13 M27 objective is an enhanced-contrast lens designed for technical microscopy applications. It provides 5x magnification with a numerical aperture of 0.13 and features a long working distance of 11.8 mm, allowing convenient specimen handling and precise focusing. Cover glass correction is not required. EC Epiplan objectives are universal lenses suitable for brightfield, differential interference contrast (DIC), and polarization techniques.

The ZEISS Objective EC Epiplan-Neofluar 2.5x/0.06 is a precision optical component designed for use in advanced microscopy applications. It is engineered to deliver reliable image quality and accurate magnification, making it suitable for educational and university environments. 

The ZEISS Objective EC Epiplan-Neofluar POL 5x/0.13 is a high-quality microscope objective designed for precise optical performance in educational and academic environments. It is built with infinity-corrected optics to ensure accurate image reproduction and compatibility with modern microscope systems. 

The ZEISS EC Epiplan Achro 100x/0.8 dry microscope objective is designed for high-magnification material and surface analysis. It provides precise image reproduction with infinity-corrected optics, making it suitable for advanced laboratory and academic applications.

The ZEISS EC Epiplan Achro 100x/0.8 dry microscope objective is designed for high-magnification material and surface analysis. It provides precise image reproduction with infinity-corrected optics, making it suitable for advanced laboratory and academic applications.

The ZEISS Objective EC Plan-Neofluar 10x/0.3 is a precision microscope objective designed for clear, flat-field imaging in educational and academic laboratories. Its plan optical correction ensures high image quality across the entire field of view, making it suitable for detailed specimen observation.

The ZEISS Objective EC Plan-Neofluar 2.5x/0.085 is a high-quality microscope objective designed for wide-field observation and precise image reproduction. With plan correction, it provides a flat and sharp image across the entire field of view.

The ZEISS EC Plan-Neofluar 5x/0.16 microscope objective is designed to deliver clear, flat-field imaging for laboratory and educational use. Its plan optical correction ensures sharp image quality across the entire field of view, making it suitable for detailed specimen observation.

The ZEISS Objective EC Plan-Neofluar Ph1 10x/0.3 is a high-performance microscope objective designed for phase contrast applications in laboratory and academic environments. With plan correction, it delivers sharp and flat images across the entire field of view.

The ZEISS EC Plan-Neofluar POL 10x/0.3 Pol microscope objective is specifically designed for polarized light microscopy in laboratory and academic environments. Its plan optical correction ensures a flat and sharp image across the entire field of view, supporting accurate specimen analysis.

The ZEISS iPlan-Achromat 100x/1.25 Oil objective is a high-performance immersion lens designed for detailed brightfield microscopy. Engineered specifically for use with the Primostar 3 microscope series, it delivers sharp, high-contrast images with reliable color correction.

The ZEISS iPlan Achromat 40x/0.65 D 0 objective is designed for use with the PrimoStar 3 microscope series. It provides reliable magnification and clear image quality for routine laboratory and educational applications. With its achromatic optical correction, it ensures accurate color reproduction and solid contrast performance.